Gas Flow Flange For A Rotating Disk Reactor For Chemical Vapor Deposition

• Main Authors: LUSE TODD A, FREMGEN ROGER P
• Format: Patent
• Language: English
• Published: 17.12.2015
• Subjects: AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR; BLASTING; CHEMISTRY; CRYSTAL GROWTH; ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS; HEATING; JOINTS OR FITTINGS FOR PIPES; LIGHTING; MEANS FOR THERMAL INSULATION IN GENERAL; MECHANICAL ENGINEERING; METALLURGY; PIPE-LINE SYSTEMS; PIPE-LINES; PIPES; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; REFINING BY ZONE-MELTING OF MATERIAL; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; SINGLE-CRYSTAL-GROWTH; STORING OF DISTRIBUTING GASES OR LIQUIDS; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; THERMAL INSULATION IN GENERAL; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; WEAPONS

A gas flow flange includes a first and a second section. The first section includes a plurality of first gas channels positioned inside and parallel to a top surface. A plurality of second gas input channels are positioned perpendicular to the top surface and extending from the top surface to the bottom surface. Each of the plurality of first gas input channels are aligned with an output of a corresponding one of the plurality of first gas input channels. The second section includes a plurality of second gas input channels that are positioned perpendicular to and extending from the top surface to the bottom surface of the second section. Each of the plurality of second gas input channels are aligned with a corresponding one of the plurality of second gas input channels. Fluid cooling conduits are positioned perpendicular to the top surface of the second section.