LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively...

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Main Authors SMEULERS JOHANNES PETRUS MARIA, VAN DER MEULEN FRITS, POLIZZI MARCO, DE GRAAF ROELOF FREDERIK, HOOGENDAM CHRISTIAAN ALEXANDER, VERHAGEN MARTINUS CORNELIS MARIA, LEENDERS MARTINUS HENDRIKUS ANTONIUS, VAN DER TOORN JAN-GERARD CORNELIS, BELFROID STEFAN PHILIP CHRISTIAAN, TEUNISSEN FRANCISCUS JOHANNES HERMAN MARIA, TEN KATE NICOLAAS, MERTENS JEROEN JOHANNES SOPHIA MARIA, OTTENS JOOST JEROEN, KEMPER NICOLAAS RUDOLF, COX HENRIKUS HERMAN MARIE, DONDERS SJOERD NICOLAAS LAMBERTUS, VOGEL HERMAN, VAN GOMPEL EDWIN AUGUSTINUS MATHEUS
Format Patent
LanguageEnglish
Published 12.11.2015
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
Bibliography:Application Number: US201514806395