METHODS OF PATTERNING AND MAKING MASKS FOR THREE-DIMENSIONAL SUBSTRATES

The present invention provides a method of making a mask for patterning a three-dimensional substrate. A mandrel includes a form machined in a surface corresponding to a shape of the substrate. A layer of material is deposited in a first region of the form and a metal layer is deposited in a second...

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Bibliographic Details
Main Authors MILLER JEFFREY, PANDOJIRAO PRAVEEN, TONER ADAM, RIALL JAMES D
Format Patent
LanguageEnglish
Published 29.10.2015
Subjects
APPARATUS THEREFOR
CHEMISTRY
CONTACT LENSES
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
OPTICS
PHYSICS
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
SPECTACLES
SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURESAS SPECTACLES
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Summary:The present invention provides a method of making a mask for patterning a three-dimensional substrate. A mandrel includes a form machined in a surface corresponding to a shape of the substrate. A layer of material is deposited in a first region of the form and a metal layer is deposited in a second region of the form. A portion of the mandrel is subsequently removed. The present invention also provides a method of patterning a three-dimensional substrate with a mask.
Bibliography:Application Number: US201514696108