STERICALLY HINDERED AMINES

A compound of the formula (A) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, and X is C2-C8alkylene or C2-C8alkylene interrupted by sulfur, is useful for stabilizing an organic material against degradation induced by light, heat or oxidation.

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Bibliographic Details
Main Authors SCHOENING KAI-UWE, MEIER HANS-RUDOLF, HINDALEKAR SHRIRANG BHIKAJI
Format Patent
LanguageEnglish
Published 30.07.2015
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Summary:A compound of the formula (A) wherein the radicals R1 are independently of one another methyl, ethyl or n-propyl, and X is C2-C8alkylene or C2-C8alkylene interrupted by sulfur, is useful for stabilizing an organic material against degradation induced by light, heat or oxidation.
Bibliography:Application Number: US201514678314