EFFICIENT OPTICAL PROXIMITY CORRECTION REPAIR FLOW METHOD AND APPARATUS

A method and apparatus for an efficient optical proximity correction (OPC) repair flow is disclosed. Embodiments may include receiving an input data stream of an integrated circuit (IC) design layout, performing one or more iterations of an OPC step and a layout polishing step on the input data stre...

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Bibliographic Details
Main Authors NING GUOXIANG, SPENCE CHRISTOPHER, ACKMANN PAUL, LIM CHIN TEONG
Format Patent
LanguageEnglish
Published 09.07.2015
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A method and apparatus for an efficient optical proximity correction (OPC) repair flow is disclosed. Embodiments may include receiving an input data stream of an integrated circuit (IC) design layout, performing one or more iterations of an OPC step and a layout polishing step on the input data stream, and performing a smart enhancement step if an output of a last iteration of the OPC step fails to satisfy one or more layout criteria and if a number of the one or more iterations satisfies a threshold value. Additional embodiments may include performing a pattern insertion process cross-linked with the OPC step, the pattern insertion process being a base optical rule check (ORC) process.
Bibliography:Application Number: US201414146771