POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

• Main Authors: JEUNINK ANDRE BERNARDUS, BEERENS RUUD ANTONIUS CATHARINA MARIA, VAN LIESHOUT RICHARD HENRICUS ADRIANUS, VAN DE WAL MARINUS MARIA JOHANNES, AANGENENT WILHELMUS HENRICUS THEODORUS MARIA, VAN DER HOEVEN SAARTJE WILLEMIJN, VAN DE GROES HENRICUS MARTINUS JOHANNES
• Format: Patent
• Language: English
• Published: 18.06.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system includes a support, a position measurement device, a deformation sensor and a processor. The support is constructed to hold the object. The position measurement device is configured to measure a position of the support. The position measurement device includes at least one position sensor target and a plurality of position sensors to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.