COPPER-CONTAINING C4 BALL-LIMITING METALLURGY STACK FOR ENHANCED RELIABILITY OF PACKAGED STRUCTURES AND METHOD OF MAKING SAME

The invention relates to a ball-limiting metallurgy stack for an electrical device that contains at least one copper layer disposed upon a Ti adhesion metal layer. The ball-limiting metallurgy stack resists Sn migration toward the upper metallization of the device.

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Bibliographic Details
Main Authors MENEZES SUSANNE, SUH DOOWON, DATTA MADHAV, EMORY DAVE, JOSHI SUBHASH M
Format Patent
LanguageEnglish
Published 14.05.2015
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Summary:The invention relates to a ball-limiting metallurgy stack for an electrical device that contains at least one copper layer disposed upon a Ti adhesion metal layer. The ball-limiting metallurgy stack resists Sn migration toward the upper metallization of the device.
Bibliography:Application Number: US201514596851