ROTATABLE SUBSTRATE SUPPORT HAVING RADIO FREQUENCY APPLICATOR

A substrate support assembly includes a shaft assembly, a pedestal coupled to a portion of the shaft assembly, and a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a first coil member surrounding a rotatable shaft member that is electrically couple...

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Bibliographic Details
Main Authors KOBAYASHI SATORU, LUBOMIRSKY DMITRY, FLOYD KIRBY HANE, PARK SOONAM, HANAWA HIROJI
Format Patent
LanguageEnglish
Published 26.03.2015
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Summary:A substrate support assembly includes a shaft assembly, a pedestal coupled to a portion of the shaft assembly, and a first rotary connector coupled to the shaft assembly, wherein the first rotary connector comprises a first coil member surrounding a rotatable shaft member that is electrically coupled to the shaft assembly, the first coil member being rotatable with the rotatable shaft, and a second coil member surrounding the first coil member, the second coil member being stationary relative to the first coil member, wherein the first coil member electrically couples with the second coil member when the rotating radio frequency applicator is energized and provides a radio frequency signal/power to the pedestal through the shaft assembly.
Bibliography:Application Number: US201314091057