SOURCE GAS JETTING NOZZLE FOR A VACUUM DEPOSITION APPARATUS

• Main Authors: HONG TAEKWON, SONG JAEBOK
• Format: Patent
• Language: English
• Published: 20.11.2014
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; NOZZLES; PERFORMING OPERATIONS; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

Disclosed is a source gas jetting nozzle which includes a connection pipe having a portion connected to a source gas supplier, a first gas pipe including a communication hole communicating with the connection pipe by connecting to one end of the connection pipe and a first jetting hole, the communication hole and the first jetting hole being formed on the outer surface of the first gas pipe, and a second gas pipe including the first gas pipe inside the second gas pipe, and including a first insertion hole for inserting a predetermined part of the connection pipe to connect the one end of the connection pipe to the communication hole of the first gas pipe, and a second jetting hole for jetting the source gas introduced from the first gas pipe.