SYSTEM AND METHOD FOR MONITORING WAFER HANDLING AND A WAFER HANDLING MACHINE

Systems, machines, and methods for monitoring wafer handling are disclosed herein. A system for monitoring wafer handling includes a sensor and a controller. The sensor is capable of being secured to an assembled wafer handling machine. The controller is in electronic communication with the sensor a...

Full description

Saved in:
Bibliographic Details
Main Authors MINER STEPHEN BRADLEY, FOSNIGHT WILLIAM JOHN, GALLAGHER RYAN
Format Patent
LanguageEnglish
Published 30.10.2014
Subjects
CONTROL OR REGULATING SYSTEMS IN GENERAL
CONTROLLING
FUNCTIONAL ELEMENTS OF SUCH SYSTEMS
MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS
PHYSICS
REGULATING
Online AccessGet full text

Cover

More Information
Summary:Systems, machines, and methods for monitoring wafer handling are disclosed herein. A system for monitoring wafer handling includes a sensor and a controller. The sensor is capable of being secured to an assembled wafer handling machine. The controller is in electronic communication with the sensor and includes control logic. The control logic is configured to store a reference output of the sensor when the wafer handling machine is aligned and is configured to generate an indication signal when a difference between the reference output and a current output of the sensor exceeds a threshold.
Bibliography:Application Number: US201313872734