METHOD OF FORMING OPTOELECTRONIC DEVICE HAVING A STABILIZED METAL OXIDE LAYER
The present invention is a method comprising depositing a metal oxide layer as part of the production of an optoelectrically active device and exposing the metal oxide layer to a reactive agent to form a relatively hydrophobic surface. The invention also includes device so made, preferably a photovo...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
02.10.2014
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention is a method comprising depositing a metal oxide layer as part of the production of an optoelectrically active device and exposing the metal oxide layer to a reactive agent to form a relatively hydrophobic surface. The invention also includes device so made, preferably a photovoltaic device, which shows improved stability as compared to devices not subject to the treatment. |
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Bibliography: | Application Number: US201214359936 |