Method of Preventing a Pattern Collapse

A device includes a substrate and at least three conducting features embedded into the substrate. Each conducting feature includes a top width x and a bottom width y, such that a top and bottom width (x1, y1) of a first conducting feature has a dimension of (x1<y1), a top and bottom width (x2, y2...

Full description

Saved in:
Bibliographic Details
Main Authors TING CHIH-YUAN, CHEN JENG-SHIOU, WU CHUNG-WEN, TSAI JANG-SHIANG, SHIEH JYU-HORNG
Format Patent
LanguageEnglish
Published 11.09.2014
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:A device includes a substrate and at least three conducting features embedded into the substrate. Each conducting feature includes a top width x and a bottom width y, such that a top and bottom width (x1, y1) of a first conducting feature has a dimension of (x1<y1), a top and bottom width (x2, y2) of a second conducting feature has a dimension of (x2<y2; x2=y2; or x2>y2), and a top and bottom width (x3, y3) of a third conducting feature has a dimension of (x3>y3). The device also includes a gap structure isolating the first and second conducting features. The gap structure can include such things as air or dielectric.
Bibliography:Application Number: US201313911604