IR REFLECTIVE MULTILAYER STRUCTURE AND METHOD FOR MANUFACTURING THE SAME

The disclosure provides an IR reflective multilayer structure, including a transparent substrate, a barrier layer disposed on the transparent substrate, wherein the barrier layer includes tungsten oxide-containing silicon dioxide, tungsten oxide-containing titanium dioxide, tungsten oxide-containing...

Full description

Saved in:
Bibliographic Details
Main Authors CHUNG PAO-TANG, FU HUAI-KUANG, JONG SUNG-JENG, CHANG YIH-HER, CHEN JER-YOUNG
Format Patent
LanguageEnglish
Published 28.08.2014
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:The disclosure provides an IR reflective multilayer structure, including a transparent substrate, a barrier layer disposed on the transparent substrate, wherein the barrier layer includes tungsten oxide-containing silicon dioxide, tungsten oxide-containing titanium dioxide, tungsten oxide-containing aluminium oxide or combinations thereof, and a heat shielding layer composed of a composite tungsten oxide, represented by Formula (I): MxWO3-yAy, wherein M is an alkali metal element or alkaline earth metal element, W is tungsten, O is oxygen, A is halogen, and 0<x 1, 0<y 0.5. The disclosure also provides a method for manufacturing an IR reflective multilayer structure.
Bibliography:Application Number: US201313920885