IR REFLECTIVE MULTILAYER STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
The disclosure provides an IR reflective multilayer structure, including a transparent substrate, a barrier layer disposed on the transparent substrate, wherein the barrier layer includes tungsten oxide-containing silicon dioxide, tungsten oxide-containing titanium dioxide, tungsten oxide-containing...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
28.08.2014
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Subjects | |
Online Access | Get full text |
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Summary: | The disclosure provides an IR reflective multilayer structure, including a transparent substrate, a barrier layer disposed on the transparent substrate, wherein the barrier layer includes tungsten oxide-containing silicon dioxide, tungsten oxide-containing titanium dioxide, tungsten oxide-containing aluminium oxide or combinations thereof, and a heat shielding layer composed of a composite tungsten oxide, represented by Formula (I): MxWO3-yAy, wherein M is an alkali metal element or alkaline earth metal element, W is tungsten, O is oxygen, A is halogen, and 0<x 1, 0<y 0.5. The disclosure also provides a method for manufacturing an IR reflective multilayer structure. |
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Bibliography: | Application Number: US201313920885 |