METHODS AND APPARATUS FOR USE WITH EXTREME ULTRAVIOLET LIGHT HAVING CONTAMINATION PROTECTION

An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or...

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Main Authors GARCIA RUDY, TORCZYNSKI JOHN R, GALLIS MICHAIL A, CHILESE FRANK, KLEBANOFF LEONARD E, GELLER ANTHONY S, DELGADO GILDARDO R, RADER DANIEL J
Format Patent
LanguageEnglish
Published 21.08.2014
Subjects
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled. to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.
Bibliography:Application Number: US201414176587