METHOD OF FORMING PHOTORESIST STRUCTURE
A method for forming a photoresist structure is provided The method includes the step of forming a photoresist layer on a substrate, the step of exposing a portion of the photoresist layer to form an exposed portion of the photoresist layer, and the step of removing the photoresist layer except the...
Saved in:
Main Authors | , , , , |
---|---|
Format | Patent |
Language | English |
Published |
07.08.2014
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | A method for forming a photoresist structure is provided The method includes the step of forming a photoresist layer on a substrate, the step of exposing a portion of the photoresist layer to form an exposed portion of the photoresist layer, and the step of removing the photoresist layer except the exposed portion with a solvent, so as to form the photoresist structure, wherein the photoresist layer has a polymer having a structure represented by formula (I). The method of the present invention can generate a photoresist with an even thickness on devices with complex geometries or three-dimensional substrates. Thus, it can be applied to tissue engineering scaffolds, three-dimensional cell cultivation system and novel bio-microelectromechnical elements. |
---|---|
AbstractList | A method for forming a photoresist structure is provided The method includes the step of forming a photoresist layer on a substrate, the step of exposing a portion of the photoresist layer to form an exposed portion of the photoresist layer, and the step of removing the photoresist layer except the exposed portion with a solvent, so as to form the photoresist structure, wherein the photoresist layer has a polymer having a structure represented by formula (I). The method of the present invention can generate a photoresist with an even thickness on devices with complex geometries or three-dimensional substrates. Thus, it can be applied to tissue engineering scaffolds, three-dimensional cell cultivation system and novel bio-microelectromechnical elements. |
Author | WU MU-GI HSIAO KAI-WEN CHEN HSIEN-YEH HSIEH CHIEHN HSU HUNG-LUN |
Author_xml | – fullname: HSU HUNG-LUN – fullname: WU MU-GI – fullname: HSIAO KAI-WEN – fullname: CHEN HSIEN-YEH – fullname: HSIEH CHIEHN |
BookMark | eNrjYmDJy89L5WRQ93UN8fB3UfB3U3DzD_L19HNXCPDwD_EPcg32DA5RCA4JCnUOCQ1y5WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgaGJkZGBiaWZo6GxsSpAgCGJSbZ |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences Physics |
ExternalDocumentID | US2014220496A1 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_US2014220496A13 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 12:05:46 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_US2014220496A13 |
Notes | Application Number: US201314023069 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140807&DB=EPODOC&CC=US&NR=2014220496A1 |
ParticipantIDs | epo_espacenet_US2014220496A1 |
PublicationCentury | 2000 |
PublicationDate | 20140807 |
PublicationDateYYYYMMDD | 2014-08-07 |
PublicationDate_xml | – month: 08 year: 2014 text: 20140807 day: 07 |
PublicationDecade | 2010 |
PublicationYear | 2014 |
RelatedCompanies | WU MU-GI NATIONAL TAIWAN UNIVERSITY HSIAO KAI-WEN HSIEH CHIEH-CHEN CHEN HSIEN-YEH HSU HUNG-LUN |
RelatedCompanies_xml | – name: HSIAO KAI-WEN – name: WU MU-GI – name: NATIONAL TAIWAN UNIVERSITY – name: HSIEH CHIEH-CHEN – name: HSU HUNG-LUN – name: CHEN HSIEN-YEH |
Score | 2.9414701 |
Snippet | A method for forming a photoresist structure is provided The method includes the step of forming a photoresist layer on a substrate, the step of exposing a... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
Title | METHOD OF FORMING PHOTORESIST STRUCTURE |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140807&DB=EPODOC&locale=&CC=US&NR=2014220496A1 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LS8NAEB5Kfd40Kj6qBJR4CqY1zW4OQWwepkIeNIn0VpK4AUHSYiL-fWeXVHvqcWdgXzA78-1-MwtwNzQKWmIYrrJ3Nlb1imkqpaauFmaeayZqjCHPdw5Cw8_01_l43oPPdS6MqBP6I4ojokWVaO-tOK9X_5dYjuBWNg_FB4qWT15qOUqHjhEtUI0ozsRy48iJbMW2rSxRwpnQjUYYDhvPiJV2eCDNK-27bxOel7LadCreEezG2F_dHkOP1RIc2Ou_1yTYD7onbwn2BEezbFDY2WFzAveBm_qRI0eejCgumIYvcuxHaYTbOU1SOUlnmc35DKdw67mp7as49uJvqYss2Zzo4xn062XNzkHOi2FRVggvKsJZn8SkZqVVNCeElCVl4wsYbOvpcrv6Cg55UxDbyAD67dc3u0Zn2xY3Yo9-AZV2fek |
link.rule.ids | 230,309,786,891,25594,76906 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LS8NAEB5KfdSbVqVq1YAST8G0ttnNIYhNGlNtktJspLeSxA0IkhYT8e87u7TaU68zsI-B2Zlv95tZgNuOkdIM03CNv_O-1su5rlFq9rTUTBLdRI3REfXOfmB4ce9l1p_V4HNdCyP7hP7I5ojoURn6eyXP6-X_JZYjuZXlffqBosWjyyxHXaFjRAtUJ6ozsIaT0Alt1batOFKDqdR1u5gOG0-IlXaI6M8rkqe3gahLWW4GFfcQdic4XlEdQY0XTWjY67_XmrDvr568m7AnOZpZicKVH5bHcOcPmRc6SugqiOL8UfCsTLyQhWjOUcSUiE1jW_AZTuDGHTLb03Du-d9W53G0udCHU6gXi4K3QEnSTprlCC9yIlifxKRmruc0IYRkGeX9M2hvG-l8u_oaGh7zx_PxKHi9gAOhkiQ30oZ69fXNLzHwVumVtNcvoPWA1g |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=METHOD+OF+FORMING+PHOTORESIST+STRUCTURE&rft.inventor=HSU+HUNG-LUN&rft.inventor=WU+MU-GI&rft.inventor=HSIAO+KAI-WEN&rft.inventor=CHEN+HSIEN-YEH&rft.inventor=HSIEH+CHIEHN&rft.date=2014-08-07&rft.externalDBID=A1&rft.externalDocID=US2014220496A1 |