IMPRINT LITHOGRAPHY

A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction acros...

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Bibliographic Details
Main Authors WUISTER SANDER FREDERIK, KRUIJT-STEGEMAN YVONNE WENDELA, LAMMERS JEROEN HERMAN, DIJKSMAN JOHAN FREDERIK, SCHRAM IVAR
Format Patent
LanguageEnglish
Published 17.07.2014
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Summary:A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate and moving the substrate, the print head; or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets.
Bibliography:Application Number: US201414222013