Detecting Defects on a Wafer Using Template Image Matching

Various embodiments for detecting defects on a wafer are provided. Some embodiments include matching a template image, in which at least some pixels are associated with regions in the device having different characteristics, to output of an electron beam inspection system and applying defect detecti...

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Bibliographic Details
Main Authors RUNYON J. REX, LAUBER JAN A, CHU XING
Format Patent
LanguageEnglish
Published 10.07.2014
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Summary:Various embodiments for detecting defects on a wafer are provided. Some embodiments include matching a template image, in which at least some pixels are associated with regions in the device having different characteristics, to output of an electron beam inspection system and applying defect detection parameters to pixels in the output based on the regions that the pixels in the output are located within to thereby detect defects on the wafer.
Bibliography:Application Number: US201313737677