APPARATUS AND METHODS FOR PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF DIELECTRIC/POLYMER COATINGS

• Main Authors: HILL ALEXANDER, CHRYSOSTOMOU DEMETRIUS, GALBREATH HERBERT VINCENT, STOREY DANIEL
• Format: Patent
• Language: English
• Published: 22.05.2014
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Apparatuses and methods are described that involve the deposition of coatings on substrates. The polymer coatings generally comprise a wear resistant layer and/or a hydrophobic layer. The wear resistant layer can comprise a metal oxide or metal nitride. The hydrophobic layer can comprise fused polymer particles having an average primary particle diameter on the nanometer to micrometer scale. The coatings are deposited on substrates using specifically adapted plasma enhanced atomic layer deposition and plasma enhanced chemical vapor deposition approaches. The substrates can include computing devices and fabrics.