SEMICONDUCTOR DEVICES INCLUDING VARIABLE WIDTH FLOATING GATES, AND APPARATUS FOR PROCESSING SUBSTRATE
A semiconductor device includes a substrate including an active region defined by a device isolation pattern and a floating gate on the active region. The floating gate includes an upper portion, a lower portion having a width greater than a width of the upper portion, and a step-difference portion...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
22.05.2014
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Subjects | |
Online Access | Get full text |
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Summary: | A semiconductor device includes a substrate including an active region defined by a device isolation pattern and a floating gate on the active region. The floating gate includes an upper portion, a lower portion having a width greater than a width of the upper portion, and a step-difference portion between the upper portion and the lower portion. A dielectric pattern is on the floating gate, and a control gate is on the dielectric pattern. The lower portion of the floating gate has a height of about 4 nm or more. |
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Bibliography: | Application Number: US201313966511 |