CHARGED PARTICLE BEAM APPARATUS

In recent years, a range of users for a charged particle beam apparatus such as a scanning electron microscope has been broadened. All users want to learn a manual adjustment technology, but it is very difficult to adjust all parameters for observation to have an appropriate value. Therefore, a begi...

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Main Authors NODA HIROYUKI, WATANABE SHUNYA, KONOMI MAMI, TOMITA SHINICHI, SATO MITSUGU, IIZUMI NORIKO, NISHIMURA MASAKO, SHIGETO KUNJI, TAMOCHI RYUICHIRO
Format Patent
LanguageEnglish
Published 15.05.2014
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Summary:In recent years, a range of users for a charged particle beam apparatus such as a scanning electron microscope has been broadened. All users want to learn a manual adjustment technology, but it is very difficult to adjust all parameters for observation to have an appropriate value. Therefore, a beginner is unlikely to sufficiently show a performance of an apparatus. This disclosure aims to provide the charged particle beam apparatus including a parameter adjustment practice function for allowing any user to easily learn the manual adjustment technology. In order to solve the above-described problem, there is provided means for practicing a focus adjustment and a stigma adjustment. Control conditions of the focus arrangement of an objective lens, an X-stigmator and a Y-stigmator are set according to the user's operation. According to a group of the focus adjustment, an X-stigma adjustment and a Y-stigma adjustment which are set, a practice-purpose image corresponding to the control conditions is read out from a storage device and is displayed on a screen.
Bibliography:Application Number: US201214232279