ROTATIONAL ABSORPTION SPECTRA FOR SEMICONDUCTOR MANUFACTURING PROCESS MONITORING AND CONTROL

• Main Authors: SUI ZHIFENG, STOUT PHILLIP, LIAN LEI, ARMACOST MICHAEL D, PATZ RYAN
• Format: Patent
• Language: English
• Published: 21.11.2013
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Methods and apparatus for semiconductor manufacturing process monitoring and control are provided herein. In some embodiments, apparatus for substrate processing may include a process chamber for processing a substrate in an inner volume of the process chamber; a radiation source disposed outside of...