Method for Forming a Graded Matching Layer Structure

A method for forming a graded matching layer structure is presented. The method includes (a) depositing a first material slurry on at least a portion of a substrate, (b) spreading the first material slurry to a form a first material layer having a first determined thickness, (c) exposing the first m...

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Bibliographic Details
Main Authors SMITH LOWELL SCOTT, SINGH PRABHJOT
Format Patent
LanguageEnglish
Published 01.08.2013
Subjects
ACOUSTICS
ACOUSTICS NOT OTHERWISE PROVIDED FOR
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
CALCULATING
COMPUTING
COUNTING
ELECTRICITY
HANDLING RECORD CARRIERS
METHODS OR DEVICES FOR PROTECTING AGAINST, OR FOR DAMPING,NOISE OR OTHER ACOUSTIC WAVES IN GENERAL
MUSICAL INSTRUMENTS
PERFORMING OPERATIONS
PHYSICS
PRESENTATION OF DATA
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
RECOGNITION OF DATA
RECORD CARRIERS
SOUND-PRODUCING DEVICES
SPRAYING OR ATOMISING IN GENERAL
TRANSPORTING
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Summary:A method for forming a graded matching layer structure is presented. The method includes (a) depositing a first material slurry on at least a portion of a substrate, (b) spreading the first material slurry to a form a first material layer having a first determined thickness, (c) exposing the first material layer using light processed through a determined light pattern mask to form a first matching layer, and (d) repeating steps (a)-(c) with different material slurries to form the graded matching layer structure.
Bibliography:Application Number: US201213362096