EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE

An exposure apparatus for projecting an image of a pattern on a substrate and for exposing the substrate is disclosed. The exposure apparatus includes a mask stage and a projection optical system. The mask stage holds plural masks so that the plural masks do not contact with each other, and the proj...

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Bibliographic Details
Main Author FUKUOKA RYOUSUKE
Format Patent
LanguageEnglish
Published 20.06.2013
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:An exposure apparatus for projecting an image of a pattern on a substrate and for exposing the substrate is disclosed. The exposure apparatus includes a mask stage and a projection optical system. The mask stage holds plural masks so that the plural masks do not contact with each other, and the projection optical system includes plural optical systems. Each of the optical systems projects an image of a pattern of one mask among the plural masks onto an exposure area of the substrate. The apparatus exposes the substrate so that each exposure area of the substrate exposed by each optical system partly overlaps with each other.
Bibliography:Application Number: US201213714244