EXPOSURE APPARATUS AND EXPOSURE METHOD
The present invention provides an exposure apparatus and an exposure method. The method comprises: utilizing an exposure light source to provide light rays to the photo-resist layer; and utilizing a reflective plate to reflect the light rays passing through the photo-resist layer and the transparent...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
20.06.2013
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention provides an exposure apparatus and an exposure method. The method comprises: utilizing an exposure light source to provide light rays to the photo-resist layer; and utilizing a reflective plate to reflect the light rays passing through the photo-resist layer and the transparent substrate back to the photo-resist layer. The present invention can reduce a line space of a pattern of the photo-resist layer. |
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Bibliography: | Application Number: US201113381350 |