METHOD FOR MANUFACTURING CONDUCTIVE LINES WITH SMALL LINE-TO-LINE SPACE

The present invention discloses a method for manufacturing conductive lines with small line-to-line space. The method for manufacturing conductive lines is to coat photoresist on a conductor layer firstly, after exposure and development treatments, then further perform an ashing treatment to complet...

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Bibliographic Details
Main Authors XUE JING-FENG, HSU JEHAO
Format Patent
LanguageEnglish
Published 23.05.2013
Subjects
BASIC ELECTRIC ELEMENTS
CABLES
CONDUCTORS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INSULATORS
SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES
SEMICONDUCTOR DEVICES
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Summary:The present invention discloses a method for manufacturing conductive lines with small line-to-line space. The method for manufacturing conductive lines is to coat photoresist on a conductor layer firstly, after exposure and development treatments, then further perform an ashing treatment to completely remove the corresponding part of the photoresist that is corresponding to the exposure area, and then perform an etching step for the conductor layer to form the required conductive lines. The method provided by the present invention can manufacture wire patterns that meet the requirement of small line-to-line space under a condition that the exposure apparatus has limited exposure accuracy.
Bibliography:Application Number: US201113379852