Chemical Bath Replenishment

Ions depleted from a chemical bath by a reaction such as plating are continually replenished by production and moving of ions through selectively permeable membranes while isolating potential contaminant ions from the chemical bath.

Saved in:
Bibliographic Details
Main Authors FITZSIMMONS JOHN ANTHONY, CHENG TIEN-JEN, WONG KEITH KWONG HON, SPEED DAVID E
Format Patent
LanguageEnglish
Published 18.04.2013
Subjects
APPARATUS THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online AccessGet full text

Cover

More Information
Summary:Ions depleted from a chemical bath by a reaction such as plating are continually replenished by production and moving of ions through selectively permeable membranes while isolating potential contaminant ions from the chemical bath.
Bibliography:Application Number: US201113274413