METHODS AND LOADPORT FOR PURGING A SUBSTRATE CARRIER

In a first aspect, a substrate carrier is provided that includes an enclosure adapted to be sealable and to house at least one substrate. The substrate carrier includes a first port leading into the enclosure and adapted to allow a flow of gas into the enclosure while the substrate carrier is closed...

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Bibliographic Details
Main Authors SHAH VINAY K, HUDGENS JEFFREY C, ELLIOTT MARTIN, ENGLHARDT ERIC
Format Patent
LanguageEnglish
Published 27.12.2012
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Summary:In a first aspect, a substrate carrier is provided that includes an enclosure adapted to be sealable and to house at least one substrate. The substrate carrier includes a first port leading into the enclosure and adapted to allow a flow of gas into the enclosure while the substrate carrier is closed. Numerous other aspects are provided.
Bibliography:Application Number: US201213605927