METHOD AND DEVICE FOR DETERMINING THE POSITION OF A FIRST STRUCTURE RELATIVE TO A SECOND STRUCTURE OR A PART THEREOF

The position of a first structure relative to a second structure can be determined by a) providing a reference image containing the first structure, b) providing a measurement image containing the second structure, in which the measurement image is recorded with an image sensor with a plurality of s...

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Bibliographic Details
Main Author ARNZ MICHAEL
Format Patent
LanguageEnglish
Published 13.12.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CALCULATING
CINEMATOGRAPHY
COMPUTING
COUNTING
ELECTROGRAPHY
HANDLING RECORD CARRIERS
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PRESENTATION OF DATA
RECOGNITION OF DATA
RECORD CARRIERS
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Summary:The position of a first structure relative to a second structure can be determined by a) providing a reference image containing the first structure, b) providing a measurement image containing the second structure, in which the measurement image is recorded with an image sensor with a plurality of sensor pixels and the image sensor has at least one known faulty sensor pixel, c) producing a masked measurement image with a masked region that corresponds to the second structure, and forming an optimization function of the shift of the masked measurement image and the reference image relative to each other, d) determining the extreme value of the optimization function and determining the optimum value of the shift based on the extreme value, and e) determining the position of the first structure relative to the second structure on the basis of the optimum shift value.
Bibliography:Application Number: US201213491729