METHOD AND DEVICE FOR DETERMINING THE POSITION OF A FIRST STRUCTURE RELATIVE TO A SECOND STRUCTURE OR A PART THEREOF
The position of a first structure relative to a second structure can be determined by a) providing a reference image containing the first structure, b) providing a measurement image containing the second structure, in which the measurement image is recorded with an image sensor with a plurality of s...
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Main Author | |
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Format | Patent |
Language | English |
Published |
13.12.2012
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Subjects | |
Online Access | Get full text |
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Summary: | The position of a first structure relative to a second structure can be determined by a) providing a reference image containing the first structure, b) providing a measurement image containing the second structure, in which the measurement image is recorded with an image sensor with a plurality of sensor pixels and the image sensor has at least one known faulty sensor pixel, c) producing a masked measurement image with a masked region that corresponds to the second structure, and forming an optimization function of the shift of the masked measurement image and the reference image relative to each other, d) determining the extreme value of the optimization function and determining the optimum value of the shift based on the extreme value, and e) determining the position of the first structure relative to the second structure on the basis of the optimum shift value. |
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Bibliography: | Application Number: US201213491729 |