CONTACTS FOR FET DEVICES

A device characterized as being an FET device structure with enlarged contact areas is disclosed. The device has a vertically recessed isolation, thereby having an exposed sidewall surface on both the source and the drain. A silicide layer is covering both the top surface and the sidewall surface of...

Full description

Saved in:
Bibliographic Details
Main Authors ZHANG YING, WONG KEITH KWONG HON, DORIS BRUCE B, CHENG KANGGUO
Format Patent
LanguageEnglish
Published 06.12.2012
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:A device characterized as being an FET device structure with enlarged contact areas is disclosed. The device has a vertically recessed isolation, thereby having an exposed sidewall surface on both the source and the drain. A silicide layer is covering both the top surface and the sidewall surface of both the source and the drain. Metallic contacts to the device engage the silicide layer on its top surface and on its sidewall surface.
Bibliography:Application Number: US201213562355