SAPPHIRE SUBSTRATES AND METHODS OF MAKING SAME

A sapphire substrate includes a generally planar surface having a crystallographic orientation selected from the group consisting of a-plane, r-plane, m-plane, and c-plane orientations, and having a nTTV of not greater than about 0.037 μm/cm2, wherein nTTV is total thickness variation normalized for...

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Bibliographic Details
Main Authors CHERIAN ISAAC K, RIZZUTO ROBERT A, CHINNAKARUPPAN PALANIAPPAN, VEDDANTHAM RAMANUJAM, TANIKELLA BRAHMANANDAM V
Format Patent
LanguageEnglish
Published 15.11.2012
Subjects
DRESSING OR CONDITIONING OF ABRADING SURFACES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
POLISHING
TRANSPORTING
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Summary:A sapphire substrate includes a generally planar surface having a crystallographic orientation selected from the group consisting of a-plane, r-plane, m-plane, and c-plane orientations, and having a nTTV of not greater than about 0.037 μm/cm2, wherein nTTV is total thickness variation normalized for surface area of the generally planar surface, the substrate having a diameter not less than about 9.0 cm.
Bibliography:Application Number: US201213472179