PHOTOMASK CLEANING APPARATUS

Provided is a photomask cleaning apparatus. The apparatus may include a photomask chuck, a cleaning arm and a nozzle set. The nozzle set may be installed in an end portion of the cleaning arm. The nozzle set may include a first nozzle and a second nozzle. The first nozzle and the second nozzle may b...

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Bibliographic Details
Main Authors LIM SUNG-TACK, KIM HYUNG-SIN, CHO JEONG-HEE, RYU SUNG-JAE
Format Patent
LanguageEnglish
Published 20.09.2012
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Summary:Provided is a photomask cleaning apparatus. The apparatus may include a photomask chuck, a cleaning arm and a nozzle set. The nozzle set may be installed in an end portion of the cleaning arm. The nozzle set may include a first nozzle and a second nozzle. The first nozzle and the second nozzle may be a bar-type shape and parallel to each other.
Bibliography:Application Number: US201213422078