METHODS FOR INTRODUCTING A FIRST GAS AND A SECEOND GAS INTO A REACTION CHAMBER

Gas distribution units of fluidized bed reactors are configured to direct thermally decomposable compounds to the center portion of the reactor and away from the reactor wall to prevent deposition of material on the reactor wall and process for producing polycrystalline silicon product in a reactor...

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Bibliographic Details
Main Authors GUPTA PUNEET, IBRAHIM JAMEEL, FOLI KWASI, KULKARNI MILIND, DEVULAPALLI BALAJI, REVANKAR VITHAL
Format Patent
LanguageEnglish
Published 13.09.2012
Subjects
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
THEIR RELEVANT APPARATUS
TRANSPORTING
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Summary:Gas distribution units of fluidized bed reactors are configured to direct thermally decomposable compounds to the center portion of the reactor and away from the reactor wall to prevent deposition of material on the reactor wall and process for producing polycrystalline silicon product in a reactor that reduce the amount of silicon which deposits on the reactor wall.
Bibliography:Application Number: US201213455483