MECHANICAL FIXTURE OF PELLICLE TO LITHOGRAPHIC PHOTOMASK

• Main Author: HOTZEL ARTHUR
• Format: Patent
• Language: English
• Published: 07.06.2012
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A pellicle frame is mechanically attached to a reticle, without use of an adhesive. An embodiment includes mechanically attaching a pellicle frame to a front surface of a reticle, removing the pellicle frame from the reticle, cleaning the reticle, and mechanically reattaching the pellicle frame to the reticle. Embodiments further include using a clamp to mechanically attach the pellicle frame to the reticle. Embodiments further include forming the pellicle frame with a flange having an opening in the center, and forming the clamp with two portions, one portion with a protrusion that fittingly engages the opening in the flange and with a second opening, and the second portion with a segment that extends behind the reticle and with a second protrusion that fittingly engages the second opening.