LITHOGRAPHIC APPARATUS AND METHOD

A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under th...

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Main Authors STEFFENS KOEN, KANEKO TAKESHI, CORCORAN GREGORY MARTIN MASON, KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS, LAURENT THIBAULT SIMON MATHIEU, KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA, VOOGD ROBBERT JAN, KUNNEN JOHAN GERTRUDIS CORNELIS, BADIE RAMIN, LAFARRE RAYMOND WILHELMUS LOUIS, BLOKS RUUD HENDRICUS MARTINUS JOHANNES
Format Patent
LanguageEnglish
Published 19.01.2012
Subjects
ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
PHOTOGRAPHY
PHYSICS
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Summary:A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
Bibliography:Application Number: US201113183220