Techniques for Pattern Process Tuning and Design Optimization for Maximizing Process-Sensitive Circuit Yields

Techniques for improving circuit design and production are provided. In one aspect, a method for virtual fabrication of a process-sensitive circuit is provided. The method comprises the following steps. Based on a physical layout diagram of the circuit, a virtual representation of the fabricated cir...

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Main Authors SINGH RAMA NAND, KANJ ROUWAIDA, KIM KEUNWOO, MUKHOPADHYAY SAIBAL, HENG FOOK-LUEN, LEE JIN-FUW, NASSIF SANI RICHARD, CHUANG CHING-TE K
Format Patent
LanguageEnglish
Published 14.07.2011
Subjects
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Summary:Techniques for improving circuit design and production are provided. In one aspect, a method for virtual fabrication of a process-sensitive circuit is provided. The method comprises the following steps. Based on a physical layout diagram of the circuit, a virtual representation of the fabricated circuit is obtained that accounts for one or more variations that can occur during a circuit production process. A quality-based metric is used to project a production yield for the virtual representation of the fabricated circuit. The physical layout diagram and/or the production process are modified. The obtaining, using and modifying steps are repeated until a desired projected production yield is attained.
Bibliography:Application Number: US20080024390