METHODS FOR REDUCING THE DEPOSITION OF SILICON ON REACTOR WALLS USING PERIPHERAL SILICON TETRACHLORIDE

Fluidized bed reactor systems and distributors are disclosed as well as processes for producing polycrystalline silicon from a thermally decomposable silicon compound such as trichlorosilane. The processes generally involve reduction of silicon deposits on reactor walls during polycrystalline silico...

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Bibliographic Details
Main Author ERK HENRY F
Format Patent
LanguageEnglish
Published 30.06.2011
Subjects
AIR
BLASTING
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
CHEMISTRY
COMBUSTION APPARATUS
COMBUSTION PROCESSES
COMPOUNDS THEREOF
FURNACES
FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL
HEATING
INORGANIC CHEMISTRY
KILNS
LIGHTING
MECHANICAL ENGINEERING
METALLURGY
METHODSOR APPARATUS FOR COMBUSTION USING FLUID FUELOR SOLID FUEL SUSPENDED IN
NON-METALLIC ELEMENTS
OPEN SINTERING OR LIKE APPARATUS
OVENS
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
RETORTS
THEIR RELEVANT APPARATUS
TRANSPORTING
WEAPONS
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Summary:Fluidized bed reactor systems and distributors are disclosed as well as processes for producing polycrystalline silicon from a thermally decomposable silicon compound such as trichlorosilane. The processes generally involve reduction of silicon deposits on reactor walls during polycrystalline silicon production by use of a silicon tetrahalide.
Bibliography:Application Number: US20100977739