SPORICIDAL COMPOSITION FOR CLOSTRIDIUM DIFFICILE SPORES

A cleaning medium or formulation that contains a sporicidal composition is described. The composition includes about 0.1-20% weight/weight of a germinant agent, about 0.01-75% w/w of an antimicrobial agent, in terms of dry or wet total weight, and which is admixed with water to generate a solution w...

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Bibliographic Details
Main Authors HE AIMIN, KIM DAEGUN, HOFFMAN DOUGLAS R, SMILTNEEK ANDREA J, KOENIG DAVID W, KIM YOUNGSOOK
Format Patent
LanguageEnglish
Published 09.06.2011
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Summary:A cleaning medium or formulation that contains a sporicidal composition is described. The composition includes about 0.1-20% weight/weight of a germinant agent, about 0.01-75% w/w of an antimicrobial agent, in terms of dry or wet total weight, and which is admixed with water to generate a solution with a pH of 3.5-9.5. The composition can help trigger the germination of spores, in particular C. difficile, and subsequently deactivate or kill the spores. A means of applying the cleaning formulation in a medium and process for cleaning are also described.
Bibliography:Application Number: US20090633883