METHOD AND APPARATUS FOR RECOVERING INDIUM FROM ETCHING WASTE SOLUTION CONTAINING INDIUM AND FERRIC CHLORIDE

• Main Authors: MIKI TAKEO, MAESETO TOMOHARU, HONMA TAKAMICHI, SUGIMOTO TAMOTSU, SAHASHI EIICHI
• Format: Patent
• Language: English
• Published: 09.06.2011
• Subjects: CHEMISTRY; CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS; FERROUS OR NON-FERROUS ALLOYS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; METALLURGY; PRETREATMENT OF RAW MATERIALS; PRODUCTION AND REFINING OF METALS; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE; TREATMENT OF ALLOYS OR NON-FERROUS METALS

An object is to provide a method and an apparatus for recovering indium, the method and apparatus ensuring that it is unnecessary to recover indium in the form of indium hydroxide, indium can be recovered at a high concentration, indium can be recovered easily by a filter or the like without handling inferiors and also, the recovery rate of indium is greatly improved. The method includes adding a precipitation-inducing metal including a metal having higher ionization tendency than indium to an etching waste solution containing at least indium and ferric chloride, in which the concentration of ferric chloride is adjusted to 20% by weight or less to thereby precipitate indium contained in the etching waste solution on the surface of the precipitation-inducing metal, then, detaching the indium precipitated on the precipitation-inducing metal from the precipitation-inducing metal by a detaching means and separating the detached solid indium or indium alloy from the solution to recover the indium.