APPARATUS AND METHOD OF VAPOR COATING IN AN ELECTRONIC DEVICE
An apparatus and method for vapor phase deposition of a reactive surface area (RSA) material onto a substrate of an electronic device. The vapor phase deposition is conducted at ambient pressures in air, and provides capture of residual vapor to minimize environmental release of RSA and other consti...
Saved in:
Main Authors | , , , , , , , , |
---|---|
Format | Patent |
Language | English |
Published |
21.04.2011
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | An apparatus and method for vapor phase deposition of a reactive surface area (RSA) material onto a substrate of an electronic device. The vapor phase deposition is conducted at ambient pressures in air, and provides capture of residual vapor to minimize environmental release of RSA and other constituents used in the processing. |
---|---|
Bibliography: | Application Number: US20090993202 |