Ferroelectric memory devices and operating methods thereof

A ferroelectric memory device having a NAND array of a plurality of ferroelectric memory cells includes: a fully depleted channel layer; a gate electrode layer; and a ferroelectric layer located between the channel layer and the gate electrode layer. The data of the plurality of ferroelectric memory...

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Bibliographic Details
Main Authors HONG KI-HA, KIM JEONG-SEOB, SHIN JAI-KWANG
Format Patent
LanguageEnglish
Published 31.03.2011
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Summary:A ferroelectric memory device having a NAND array of a plurality of ferroelectric memory cells includes: a fully depleted channel layer; a gate electrode layer; and a ferroelectric layer located between the channel layer and the gate electrode layer. The data of the plurality of ferroelectric memory cells is erased by applying a first erase voltage to a bit line and a common source line and applying a second erase voltage to a string selection line and a ground selection line.
Bibliography:Application Number: US20100923131