REFLOW METHOD, PATTERN GENERATING METHOD, AND FABRICATION METHOD FOR TFT FOR LCD

A to-be-processed object including an underlying layer and a resist film giving a pattern allowing formation of an exposure region in which the underlying layer is exposed at an upper layer to the underlying layer and a coverage region in which the underlying layer is covered is prepared. A reflow m...

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Bibliographic Details
Main Author ASOU YUTAKA
Format Patent
LanguageEnglish
Published 17.03.2011
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A to-be-processed object including an underlying layer and a resist film giving a pattern allowing formation of an exposure region in which the underlying layer is exposed at an upper layer to the underlying layer and a coverage region in which the underlying layer is covered is prepared. A reflow method is provided which softens the resist film to be in a flowing state, resulting in a part of or all of the exposure region covered by it. The resist film has different regions in thickness of at least a thick region and a thin region relatively thinner than the thick region.
Bibliography:Application Number: US20100947477