CLEANING MODULE, EUV LITHOGRAPHY DEVICE AND METHOD FOR THE CLEANING THEREOF

In order to clean optical components (35) inside an EUV lithography device in a gentle manner, a cleaning module for an EUV lithography device includes a supply line for molecular hydrogen and a heating filament for producing atomic hydrogen and hydrogen ions for cleaning purposes. The cleaning modu...

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Bibliographic Details
Main Authors EHM DIRK HEINRICH, KRAUS DIETER, HEMBACHER STEFAN, KOEHLER STEFAN, WIESNER STEFAN, SCHMIDT STEFAN-WOLFGANG, CZAP ALMUT, CHUNG HIN YIU ANTHONY
Format Patent
LanguageEnglish
Published 24.02.2011
Subjects
ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
CONVERSION OF CHEMICAL ELEMENTS
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
RADIOACTIVE SOURCES
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Summary:In order to clean optical components (35) inside an EUV lithography device in a gentle manner, a cleaning module for an EUV lithography device includes a supply line for molecular hydrogen and a heating filament for producing atomic hydrogen and hydrogen ions for cleaning purposes. The cleaning module also has an element, (33) arranged to apply an electric and/or magnetic field, downstream of the heating filament (29) in the direction of flow of the hydrogen (31, 32). The element can be designed as a deflection unit, as a filter unit and/or as an acceleration unit for the ion beam (32).
Bibliography:Application Number: US20100883247