Ion Implanter, Internal Structure of Ion Implanter and Method of Forming A Coating Layer in the Ion Implanter

An ion implanter includes a process chamber and a coating layer. The process chamber receives a substrate and provides a space to perform an ion implantation process on the substrate. The coating layer is disposed on an inner wall of the process chamber to reduce contamination of the substrate and i...

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Bibliographic Details
Main Authors KIM SAM-WOONG, JANG KYUNG-IC, YE KYUNG-HWAN, REIM YONG-SUP
Format Patent
LanguageEnglish
Published 30.12.2010
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:An ion implanter includes a process chamber and a coating layer. The process chamber receives a substrate and provides a space to perform an ion implantation process on the substrate. The coating layer is disposed on an inner wall of the process chamber to reduce contamination of the substrate and includes the same material as that of the substrate.
Bibliography:Application Number: US20080667303