METHODS AND APPARATUS TO PREDICT PROCESS QUALITY IN A PROCESS CONTROL SYSTEM

Example methods and apparatus to predict process quality in a process control system are disclosed. A disclosed example method includes receiving process control information relating to a process at a first time including a first value associated with a first measured variable and a second value ass...

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Bibliographic Details
Main Authors NIXON MARK, REISS RANDOLF, WOJSZNIS WILHELM K, WOREK CHRISTOPHER, BLEVINS TERRENCE LYNN, MUSTON PAUL RICHARD
Format Patent
LanguageEnglish
Published 16.12.2010
Subjects
ANALOGUE COMPUTERS
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Summary:Example methods and apparatus to predict process quality in a process control system are disclosed. A disclosed example method includes receiving process control information relating to a process at a first time including a first value associated with a first measured variable and a second value associated with a second measured variable, determining if a variation based on the received process control information associated with the process exceeds a threshold, if the variation exceeds the threshold, calculating a first contribution value based on a contribution of the first measured variable to the variation and a second contribution value based on a contribution of the second measured variable to the variation, determining at least one corrective action based on the first contribution value, the second contribution value, the first value, or the second value, and calculating a predicted process quality based on the at least one corrective action at a time after the first time.
Bibliography:Application Number: US20090538995