METHOD FOR CALIBRATING A PYROMETER, METHOD FOR DETERMINING THE TEMPERATURE OF A SEMICONDUCTING WAFER AND SYSTEM FOR DETERMINING THE TEMPERATURE OF A SEMICONDUCTING WAFER
The present invention relates to a method for calibrating a pyrometer, a method for determining the temperature of a semiconducting wafer and a system for determining the temperature of a semiconducting wafer. It is an object of the present invention to provide a method for calibrating a pyrometer w...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English |
Published |
18.11.2010
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention relates to a method for calibrating a pyrometer, a method for determining the temperature of a semiconducting wafer and a system for determining the temperature of a semiconducting wafer. It is an object of the present invention to provide a method for calibrating a pyrometer which overcomes the disadvantages of the prior art. According to the invention, during the heating process, a first optical radiation having a first wavelength is irradiated onto the calibration sample (12), a first reflection signal resulting from reflection of the first radiation on the calibration sample (12) is measured, and a first reflectance of the calibration sample (12) for the first wavelength from the measured first reflection signal is determined, a second optical radiation having a second wavelength is irradiated onto the calibration sample (12), the first wavelength and the second wavelength being different from each other, a second reflection signal resulting from reflection of the second radiation on the calibration sample (12) is measured, and a second reflectance of the calibration sample (12) for the second wavelength from the measured second reflection signal is determined and, by the pyrometer (1), a thermal radiation signal received from the calibration sample (12) is measured, wherein a temperature of the calibration sample (12) is determined from the ratio of the first reflectance and the second reflectance and wherein the pyrometer (1) is calibrated by assigning the determined temperature of the calibration sample (12) with the thermal radiation signal measured by the pyrometer (1). |
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Bibliography: | Application Number: US20100777661 |