Method for fabricating semiconductor package substrate having different thicknesses between wire bonding pad and ball pad

A method for fabricating a semiconductor package substrate, including: preparing a copper clad laminate and half etching a copper foil on a wire bonding pad side of the copper clad laminate; depositing a first etching resist on the opposite sides of the copper clad laminate; forming circuit patterns...

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Bibliographic Details
Main Authors SHIN YOUNG HWAN, KIM YOON SU, LEE TAE GON, YOON KYOUNG RO
Format Patent
LanguageEnglish
Published 14.10.2010
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Summary:A method for fabricating a semiconductor package substrate, including: preparing a copper clad laminate and half etching a copper foil on a wire bonding pad side of the copper clad laminate; depositing a first etching resist on the opposite sides of the copper clad laminate; forming circuit patterns on the first etching resist, constructing circuits including a wire bonding pad and a ball pad after the model of the circuit patterns, and removing the first etching resist; applying a solder resist to the copper clad laminate in such a way to expose the wire bonding pad and the ball pad; and plating the wire bonding pad with gold and subjecting the ball pad to surface treatment.
Bibliography:Application Number: US20100801723