CAPACITIVELY COUPLED PLASMA (CCP) GENERATOR WITH TWO INPUT PORTS

A capacitively coupled plasma (CCP) generator with two input ports, which is especially used as a large-area capacitively coupled plasma (CCP) generator. In the inventive CCP generator, only a RF power supply is required to provide the two input ports with RF power. The input impedance at each of th...

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Bibliographic Details
Main Authors WU TUNGUAN, LIANG MUH-WANG, WU CHING-HUEI, CHANG CHIHN, HUANG JEN-RONG, LO CHAN-HSING, CHANG CHIA-HAO
Format Patent
LanguageEnglish
Published 10.06.2010
Subjects
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Summary:A capacitively coupled plasma (CCP) generator with two input ports, which is especially used as a large-area capacitively coupled plasma (CCP) generator. In the inventive CCP generator, only a RF power supply is required to provide the two input ports with RF power. The input impedance at each of the input ports is adjustable so that the standing wave between two rectangular electrodes can be eliminated to achieve plasma uniformity.
Bibliography:Application Number: US20090425154