SYSTEMS, METHODS AND SOLUTIONS FOR CLEANING CRYSTAL GROWTH VESSELS
The disclosure provides mixed acid solutions for cleaning a vessel, such as a vessel used for growing a GaAs crystal, comprising nitric acid, hydrofluoric acid and water. Further, the disclosure also provides exemplary methods for cleaning a vessel for growing a GaAs crystal, by: a) immersing the ve...
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Main Author | |
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Format | Patent |
Language | English |
Published |
27.05.2010
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Subjects | |
Online Access | Get full text |
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Summary: | The disclosure provides mixed acid solutions for cleaning a vessel, such as a vessel used for growing a GaAs crystal, comprising nitric acid, hydrofluoric acid and water. Further, the disclosure also provides exemplary methods for cleaning a vessel for growing a GaAs crystal, by: a) immersing the vessel in a mixed acid solution; b) immersing the vessel in an ammonia solution; c) cleansing the vessel with a surfactant solution under supersonic vibration; and d) cleansing the vessel with deionized water under supersonic vibration. |
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Bibliography: | Application Number: US20090581160 |