SUBSTRATE MOUNTING TABLE AND SUBSTRATE PROCESSING APPARATUS HAVING SAME
A substrate mounting table includes a mounting table main body, a mounting unit provided at an upper portion of the mounting table main body, a heat source transferring a (cold) heat to the upper portion of the mounting table main body, and a heat transfer control part. The heat transfer control par...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | English |
Published |
20.05.2010
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A substrate mounting table includes a mounting table main body, a mounting unit provided at an upper portion of the mounting table main body, a heat source transferring a (cold) heat to the upper portion of the mounting table main body, and a heat transfer control part. The heat transfer control part includes a cavity portion provided in the mounting table main body to correspond to the mounted substrate, and a solid member filled in the cavity portion and having pores communicating with one another. The heat transfer control part controls a heat transfer level from the heat source by supplying or exhausting a heat transfer gas to or from the cavity portion. A controller controls the supplying and the exhausting of the heat transfer gas to and from the cavity portion by a heat transfer gas supply unit and a heat transfer gas exhaust unit, respectively. |
---|---|
Bibliography: | Application Number: US20090613096 |